Influence of substrate temperature on mechanical, optical and electrical properties of ZnO:Al films

被引：70
|
作者：
Wen, Ruitao [1 ]
Wang, Laisen [1 ]
Wang, Xuan [1 ]
Yue, Guang-Hui [1 ]
Chen, Yuanzhi [1 ]
Peng, Dong-Liang [1 ]
机构：
[1] Xiamen Univ, Dept Mat Sci & Engn, Coll Mat, Xiamen 361005, Peoples R China
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 508卷 / 02期
基金：
美国国家科学基金会;
关键词：
Nanostructures; Thin films; Sputtering; Mechanical properties; High transparency; ZINC-OXIDE FILMS; TRANSPARENT; DEPENDENCE;
D O I：
10.1016/j.jallcom.2010.08.034
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The Al-doped zinc oxide (ZnO:Al) films were prepared on quartz glass flakes and silicon wafers by radio frequency (RF) magnetron sputtering which uses an aluminum-doped zinc oxide ceramic target. Meanwhile, their properties were characterized by scanning electron microscopy, X-ray diffraction, infrared-UV spectrophotometry, resistance measurement, nano-scratch and indentation test. Evolutions of the structural, optical, electrical and mechanical properties of the ZnO:Al films as a function of substrate temperatures ranging from room temperature to 400 degrees C were analyzed. The results indicate that the ZnO:Al films with a low resistivity value of 4.97 x 10(-4) Omega cm, a relatively higher adhesion and a high transparency above 90%, can be prepared at a substrate temperature of 400 degrees C. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：370 / 374
页数：5
相关论文
共 50 条
  • [31] INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE STRUCTURAL, OPTICAL AND ELECTRICAL-PROPERTIES OF ZNO THIN-FILMS PREPARED BY SPRAY PYROLYSIS
    AFIFY, HH
    NASSER, SA
    DEMIAN, SE
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1991, 2 (03) : 152 - 156
  • [32] Influence of the substrate temperature on the optical and electrical properties of Ga-doped ZnO thin films fabricated by pulsed laser deposition
    Hyun Ho Shin
    Yang Hee Joung
    Seong Jun Kang
    Journal of Materials Science: Materials in Electronics, 2009, 20
  • [33] Influence of substrate temperature on the electrical and optical properties of Ga-doped ZnO thin films fabricated by continuous composition spread
    Jung, Keun
    Choi, Won-Kook
    Yoon, Seok-Jin
    Kim, Hyun Jae
    Choi, Ji-Won
    CERAMICS INTERNATIONAL, 2012, 38 : S605 - S608
  • [34] Influence of the substrate temperature on the optical and electrical properties of Ga-doped ZnO thin films fabricated by pulsed laser deposition
    Shin, Hyun Ho
    Joung, Yang Hee
    Kang, Seong Jun
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2009, 20 (08) : 704 - 708
  • [35] Influence of structural changes on electrical properties of Al:ZnO films
    Urper, Osman
    Baydogan, Nilgun
    MATERIALS LETTERS, 2020, 258 (258)
  • [36] Influence of substrate temperature on the structure and electric properties of ZnO films
    Lu, H
    Yin, QJ
    Xia, JZ
    Pan, XR
    CHINESE JOURNAL OF CHEMICAL PHYSICS, 2005, 18 (06) : 1034 - 1038
  • [37] Influence of sputtering pressure on morphological, mechanical and electrical properties of Al-doped ZnO films
    Kar, J. P.
    Kim, S.
    Shin, B.
    Park, K. I.
    Ahn, K. J.
    Lee, W.
    Cho, J. H.
    Myoung, J. M.
    SOLID-STATE ELECTRONICS, 2010, 54 (11) : 1447 - 1450
  • [38] Role of annealing temperature on electrical and optical properties of Al-doped ZnO thin films
    Gurbuz, Osman
    Guner, Sadik
    CERAMICS INTERNATIONAL, 2015, 41 (03) : 3968 - 3974
  • [39] Influence of positive substrate bias on the electrical properties of ZnO:Al films prepared by DC magnetron sputtering
    Lim, D. G.
    Kang, G. S.
    Kwon, S. I.
    Park, M. W.
    Kwak, D. J.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 50 (06) : 1697 - 1700
  • [40] The influence of homo-buffer layer on structural, optical and electrical properties of ZnO:Al films
    Li, Q. K.
    Wang, J. B.
    Li, B.
    Zhong, X. L.
    Wang, F.
    Tan, C. B.
    APPLIED SURFACE SCIENCE, 2013, 283 : 623 - 628
12345