Extraction of a low-current discharge from a microplasma for nanoscale patterning applications at atmospheric pressure

被引:8
|
作者
Lee, Seung Whan [1 ]
Zamani, Hamidreza [2 ]
Feng, Philip X. -L. [2 ]
Sankaran, R. Mohan [1 ]
机构
[1] Case Western Reserve Univ, Dept Chem Engn, Cleveland, OH 44106 USA
[2] Case Western Reserve Univ, Dept Elect Engn & Comp Sci, Cleveland, OH 44106 USA
来源
关键词
CHEMICAL REDUCTION METHOD; BEAM-INDUCED DEPOSITION; PLASMA; NANOPARTICLES; PLATINUM; FILMS;
D O I
10.1116/1.3669523
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors present a scheme to extract a low-current discharge from a microplasma at atmospheric pressure for nanopatterning applications. The extracted discharge is generated by applying a high positive voltage to an independent electrode and accelerating electrons from the microplasma. Current-voltage (I-V) characteristics of the extracted discharge show high stability at low currents and tunability over a wide range of currents. Exposure of metal precursor loaded films to the extracted discharge results in electrochemical reduction of metal ions to solid metal, as confirmed by X-ray photoelectron spectroscopy. Combining this approach with masking techniques allows the transfer of nanoscale patterns of metal at ambient conditions. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3669523]
引用
收藏
页数:5
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