Investigation of bulk laser damage in CsLiB6B10 crystal

被引:3
|
作者
Yoshimura, M [1 ]
Kamimura, T [1 ]
Murase, K [1 ]
Inoue, T [1 ]
Mori, Y [1 ]
Sasaki, T [1 ]
Yoshida, H [1 ]
Nakatsuka, M [1 ]
机构
[1] Osaka Univ, Dept Elect Engn, Suita, Osaka 565, Japan
关键词
CsLiB6O10 (CLBO); bulk laser damage;
D O I
10.1117/12.306999
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bulk laser damage in CsLiB6O10 (CLBO) was measured using a single-shot Q-switched Nd:YAG laser in a transverse and longitudinal single mode. The bulk laser damage thresholds of CLBO, with laser irradiation direction parallel to[001] and polarization parallel to[100], were determined to be 29 GW/cm(2) at 1.064 mu, and 6.4 GW/cm(2) at 0.266 mu m. The value at 1.064 mu m is higher than that of fused quartz, beta-BaB2O4 (BBO) and KH2PO4 (KDP). The morphology of bulk damage in CLBO crystal was also observed. The damage pattern suggests that the [001] direction is mechanically weak, which is consistent with the result of the mechanical strength tests.
引用
收藏
页码:106 / 110
页数:5
相关论文
共 50 条
  • [41] Progress in the growth of a CsLiB6O10 crystal and its application to ultraviolet light generation
    Sasaki, T
    Mori, Y
    Yoshimura, M
    OPTICAL MATERIALS, 2003, 23 (1-2) : 343 - 351
  • [42] Linewidth effect of CsLiB6O10 crystal optical parametric oscillator on pumping beam parameters
    Wang, LW
    Shong, CR
    Mao, LQ
    Tian, HB
    Nonlinear Optical Phenomena and Applications, 2005, 5646 : 563 - 567
  • [43] LASER-INDUCED BULK DAMAGE IN POTASSIUM DIHYDROGEN PHOSPHATE CRYSTAL
    SINGLETON, MF
    COOPER, JF
    ANDRESEN, BD
    MILANOVICH, FP
    APPLIED PHYSICS LETTERS, 1988, 52 (11) : 857 - 859
  • [44] High-power 355-nm UV generation in CsLiB6O10 crystal
    Yoshimura, M.
    Ueda, K.
    Orii, Y.
    Takahashi, Y.
    Okada, G.
    Mori, Y.
    2016 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2016,
  • [45] Large aperture CsLiB6O10 frequency doubler for high energy Nd:glass laser
    Kiriyama, H
    Inoue, N
    Yamakawa, K
    HIGH-POWER LASERS AND APPLICATIONS II, 2002, 4914 : 6 - 13
  • [46] Effect of ultra-short pulse laser for second harmonic generation in CsLiB6O10
    Wang Li
    Han Xiuyou
    ADVANCED LASER TECHNOLOGIES 2005, PTS 1 AND 2, 2006, 6344
  • [47] Theoretical treatment and simulation of new UV crystal CsLiB6O10 in third-harmonic generation
    L. Wang
    S. Chen
    Journal of Experimental and Theoretical Physics Letters, 2001, 74 : 578 - 582
  • [48] Theoretical treatment and simulation of new UV crystal CsLiB6O10 in third-harmonic generation
    Wang, L
    Chen, S
    JETP LETTERS, 2001, 74 (12) : 578 - 582
  • [49] Picosecond high-power 355-nm UV generation in CsLiB6O10 crystal
    Ueda, Kentaro
    Orii, Yosuke
    Takahashi, Yoshinori
    Okada, George
    Mori, Yusuke
    Yoshimura, Masashi
    OPTICS EXPRESS, 2016, 24 (26): : 30465 - 30473
  • [50] Numerical analysis of conversion efficiency in second-harmonic generation in new crystal CsLiB6O10
    L. Wang
    S. Chen
    Journal of Experimental and Theoretical Physics Letters, 2002, 75 : 513 - 516