Extension of aberration theory of grating systems from one- to two-dimension extended source

被引：8

作者：

Lu, Li-Jun ^{[1
]}

Zhu, Guo-Qiang ^{[1
]}

机构：

[1] Shanghai Univ, Dept Fine Mech Engn, Shanghai 200072, Peoples R China

来源：

OPTIK | 2012年 / 123卷 / 02期

关键词：

Grating; Synchrotron radiation; XUV optics; Aberration; LIE TRANSFORMATIONS; IMAGING EQUATIONS; GEOMETRIC-THEORY; OPTICAL-SYSTEMS;

D O I：

10.1016/j.ijleo.2011.03.014

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The aberration theory of grating systems is extended from one-dimension to two-dimension extended source. In deriving the aberration formulae, the concept that pupil in the meridional plane is separate from the one in the sagittal plane is applied and the principal ray is determined by a linear equation. Using the Seidel aberration for reference, the aberrations are classified into seven types according to the geometrical characteristics. The numerical simulation of imaging of one model optical systems is made with the aberration formulae and exact ray tracing to examine the accuracy of the aberration formulae. (C) 2011 Elsevier GmbH. All rights reserved.

引用

页码：157 / 166

页数：10

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