An in-situ X-ray topography observation of dislocations, crystal-melt interface and melting of silicon

被引:6
|
作者
Wang, YR [1 ]
Kakimoto, K [1 ]
机构
[1] Kyushu Univ, Inst Adv Mat Study, Kasuga, Fukuoka 816, Japan
关键词
silicon; crystal-melt interface; dislocation; X-ray topography;
D O I
10.1016/S0167-9317(00)00517-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An in-situ observation on the crystal-melt interfaces, their propagations and dislocations during the melting of silicon was carried out by X-ray topography technique. The dislocation-free melting process was successfully observed through the optimization of temperature distribution in the furnace and the shape of the sample. The melting with and without dislocations near the melting zone was discussed. It was demonstrated that the crystal-melt interface was kept hat during the dislocation-free melting, while the interface was rough if an isolated dislocation appeared in the melting zone. (C) 2001 Elsevier Science BN. All rights reserved.
引用
收藏
页码:143 / 146
页数:4
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