Formation of AsxSb1-x mixing interfaces in InAs/GaSb superlattices grown by metalorganic chemical vapor deposition

被引:3
|
作者
Li, Li-Gong [1 ,2 ]
Liu, Shu-Man [1 ]
Luo, Shuai [1 ]
Yang, Tao [1 ]
Wang, Li-Jun [1 ]
Liu, Feng-Qi [1 ]
Ye, Xiao-Ling [1 ]
Xu, Bo [1 ]
Wang, Zhan-Guo [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
PHONONS;
D O I
10.1209/0295-5075/97/36001
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Metalorganic chemical vapor deposition growth of InAs/GaSb superlattices is reported using an AsxSb1-x plane that connects the InAs and GaSb layers to compensate the tensile strain introduced by the InAs layers. The effects of gas switching sequences for growing the AsxSb1-x planes on the interface structure and crystalline quality of InAs/GaSb superlattices were investigated by Raman scattering spectroscopy and X-ray diffraction. It is found that uniform interfaces and high-quality superlattice can be obtained by growing the AsxSb1-x planes through the exchange interaction of As and Sb atoms at the surfaces of InAs or GaSb layers. Copyright (C) EPLA, 2012
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页数:4
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