Friction anisotropy at Pd(100)/Pd(100) interfaces

被引:25
|
作者
Mancinelli, CM [1 ]
Gellman, AJ [1 ]
机构
[1] Carnegie Mellon Univ, Dept Chem Engn, Pittsburgh, PA 15213 USA
关键词
D O I
10.1021/la034764e
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Friction anisotropy was studied between two Pd(100) single-crystal surfaces sliding in an ultrahigh vacuum environment. Friction measurements were made using Pd(100)/Pd(100) interfaces modified by adsorption of octane at coverages ranging from 4 to 40 molecular monolayers (ML). The relative crystallographic orientation of the two Pd(100) surfaces was systematically varied and friction measurements were made at each orientation as a function of octane coverage. These measurements have revealed that friction is anisotropic with respect to Pd(100) lattice orientation. When the surfaces were aligned, forming a commensurate interface, and sheared along the <110> direction with 4 ML of octane at the interface, the static friction coefficient was mu(s) > 8.0 +/- 2.0. A minimum in the static friction coefficient was obtained when the two Pd(100) surfaces with 4 ML of octane at the interface were misoriented by theta = 45degrees. Under these conditions, the static friction coefficient for sliding along the <110> direction of the stationary surface was mu(s) = 4.0 +/- 2.0. Higher coverages of octane decreased the friction, but friction anisotropy persisted for coverages of octane up to 20 ML at the interface. Wear scars were observed on both surfaces indicating that plastic deformation occurred during sliding. The observation of friction anisotropy in the presence of disordered overlayers of octane and during shearing of surfaces that deform plastically suggests that friction anisotropy originates with the properties of the bulk crystal lattices rather than surface lattice commensurability. These results corroborate the findings of a previous study of friction anisotropy between Ni(100) surfaces.
引用
收藏
页码:1680 / 1687
页数:8
相关论文
共 50 条
  • [21] Electronic Friction Dominates Hydrogen Hot-Atom Relaxation on Pd(100)
    Blanco-Rey, M.
    Juaristi, J. I.
    Diez Muino, R.
    Busnengo, H. F.
    Kroes, G. J.
    Alducin, M.
    PHYSICAL REVIEW LETTERS, 2014, 112 (10)
  • [22] Effect of hydrogen on the surface relaxation of Pd(100), Rh(100), and Ag(100)
    Jung, SC
    Kang, MH
    PHYSICAL REVIEW B, 2005, 72 (20)
  • [23] LEVEL SCHEMES OF PD-102 AND PD-100
    PIEL, WF
    SCHARFFGOLDHABER, G
    LUMPKIN, AH
    LEE, YK
    STROMSWOLD, DC
    PHYSICAL REVIEW C, 1981, 23 (02): : 708 - 732
  • [24] Dehydrogenation of methanol on Pd(100): comparison with the results of Pd(111)
    Jiang, Ruibin
    Guo, Wenyue
    Li, Ming
    Lu, Xiaoqing
    Yuan, Jianye
    Shan, Honghong
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2010, 12 (28) : 7794 - 7803
  • [25] MAGNETIZATION OF (100)NIFE FILMS DEPOSITED ON (100)PD/CU/SI(100)
    CHANG, CA
    APPLIED PHYSICS LETTERS, 1991, 58 (21) : 2444 - 2446
  • [26] Molecular layering effects on friction at Ni(100)/Ni(100) interfaces
    Ko, JS
    Gellman, AJ
    JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (22): : 5186 - 5195
  • [27] DISINTEGRATION OF PD-100 AND RH-100 LEVEL
    ANTONEVA, NM
    GRIGOREV, EP
    ZOLOTAVI.AV
    NIKITIN, MK
    SERGEEV, VO
    PROTASOV.LF
    IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1970, 34 (10): : 2131 - &
  • [28] Formation of Epitaxial PdO(100) During the Oxidation of Pd(100)
    Mehar, Vikram
    Edstrom, Helen
    Shipilin, Mikhail
    Hejral, Uta
    Wu, Chengjun
    Kadiri, Aravind
    Albertin, Stefano
    Hagman, Benjamin
    von Allmen, Kim
    Wiegmann, Tim
    Pfaff, Sebastian
    Drnec, Jakub
    Zetterberg, Johan
    Lundgren, Edvin
    Merte, Lindsay R.
    Gustafson, Johan
    Weaver, Jason F.
    JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2023, 14 (38): : 8493 - 8499
  • [29] THE INTERACTION OF HYDROGEN WITH A PD(100) SURFACE
    HE, JW
    HARRINGTON, DA
    GRIFFITHS, K
    NORTON, PR
    SURFACE SCIENCE, 1988, 198 (03) : 413 - 430
  • [30] RAIRS of small alkynes on Pd(100)
    Camplin, JP
    Eve, JK
    McCash, EM
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2000, 2 (19) : 4433 - 4440