Nucleation and growth of anodic oxide films on bismuth

被引:27
|
作者
Grubac, Z
Metikos-Hukovic, M
机构
[1] Univ Zagreb, Fac Chem Engn & Technol, Dept Electrochem, Zagreb 10000, Croatia
[2] Univ Split, Fac Technol, Dept Inorgan Chem, Split 21000, Croatia
关键词
nucleation; oxide films; bismuth; potentiostatic transients; cyclic voltammetry;
D O I
10.1016/S0013-4686(98)00005-X
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Combined voltammetry and potentiostatic transient techniques have been used to study nucleation, formation and growth of thin oxide films on high purity polycrystalline bismuth in a berate buffer solution, pH = 9.2. It was shown that the initial step in the formation of the continuous anodic layer of bismuth oxide on bismuth is a nucleation process. The potentiostatic technique was a valuable tool in its study. The oxide him nucleation kinetics were explained reasonably well through a 3D progressive nucleation and growth mechanism under diffusion controlled growth. Nucleation potential (E-AN), steady-state nucleation rate (AN(0)) and the number density of growing centre (N-s) are determined. A detailed mechanistic interpretation of the nucleation process and thickening of the anodic layer under potentiodynamic conditions was obtained using the criteria of cyclic voltammetry. (C) 1998 Published by Elsevier Science Ltd. All rights reserved.
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页码:3175 / 3181
页数:7
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