Strong perpendicular exchange bias in epitaxial La0.7Sr0.3MnO3:LaFeO3 nanocomposite thin films
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作者:
Fan, Meng
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Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USATexas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Fan, Meng
[1
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Zhang, Wenrui
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Texas A&M Univ, Dept Mat Sci & Engn, College Stn, TX 77843 USATexas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Zhang, Wenrui
[2
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Jian, Jie
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Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USATexas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Jian, Jie
[1
]
Huang, Jijie
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Texas A&M Univ, Dept Mat Sci & Engn, College Stn, TX 77843 USATexas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Huang, Jijie
[2
]
Wang, Haiyan
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Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Texas A&M Univ, Dept Mat Sci & Engn, College Stn, TX 77843 USA
Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USATexas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
Wang, Haiyan
[1
,2
,3
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机构:
[1] Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
[2] Texas A&M Univ, Dept Mat Sci & Engn, College Stn, TX 77843 USA
[3] Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Strong exchange bias (EB) in perpendicular direction has been demonstrated in vertically aligned nanocomposite (VAN) (La0.7Sr0.3MnO3)(1-x) : (LaFeO3)(x) (LSMO:LFO, x = 0.33, 0.5, 0.67) thin films deposited by pulsed laser deposition. Under a moderate magnetic field cooling, an EB field as high as similar to 800 Oe is achieved in the VAN film with x = 0.33, suggesting a great potential for its applications in high density memory devices. Such enhanced EB effects in perpendicular direction can be attributed to the high quality epitaxial co-growth of vertically aligned ferromagnetic LSMO and antiferromagnetic LFO phases, and the vertical interface coupling associated with a disordered spin-glass state. The VAN design paves a powerful way for integrating perpendicular EB effect within thin films and provides a new dimension for advanced spintronic devices. (C) 2016 Author(s).
机构:
IMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Perna, P.
Rodrigo, C.
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Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Rodrigo, C.
Jimenez, E.
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Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Jimenez, E.
Teran, F. J.
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IMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Teran, F. J.
Mikuszeit, N.
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IMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Mikuszeit, N.
Mechin, L.
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GREYC UMR6072 CNRS ENSICAEN, F-14050 Caen, France
Univ Caen Basse Normandie, F-14050 Caen, FranceIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Mechin, L.
Camarero, J.
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机构:
IMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Camarero, J.
Miranda, R.
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机构:
IMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, SpainIMDEA Nanociencia, Inst Madrileno Estudios Avanzados Nanociencia, Madrid 28049, Spain
机构:
Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Cheng, W. F.
Leung, C. W.
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Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
机构:
Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Fan, Meng
Wang, Han
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Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Wang, Han
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Misra, Shikhar
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Zhang, Bruce
Qi, Zhimin
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Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Qi, Zhimin
Sun, Xing
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Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Sun, Xing
Huang, Jijie
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机构:
Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Huang, Jijie
Wang, Haiyan
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机构:
Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
Purdue Univ, Dept Elect & Comp Engn, W Lafayette, IN 47907 USAPurdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA
机构:
Dept. of Mat. Sci. and Engineering, Cornell University, Ithaca, NY 14853, United StatesDept. of Mat. Sci. and Engineering, Cornell University, Ithaca, NY 14853, United States
Suzuki, Y.
Hwang, H.Y.
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Bell Laboratories, Lucent Technologies, 700 Mountain Avenue, Murray Hill, NJ 07974, United StatesDept. of Mat. Sci. and Engineering, Cornell University, Ithaca, NY 14853, United States