Overview of CD-SEM - and beyond

被引：0

作者：

Joy, DC ^{[1
]}

机构：

[1] Univ Tennessee, EM Facil, Knoxville, TN 37996 USA

来源：

CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY | 2003年 / 683卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The CD-SEM, which has been the major tool for critical dimension metrology for the last twenty years, now faces severe challenges to its utility and predominance. The problems that must be solved are outlined, and the possible scenarios for progress are described.

引用

页码：619 / 626

页数：8

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