High throughput dewetting of polystyrene on gradient etched silicon surfaces.

被引：0
|
作者：
Ashley, K
Raghavan, D
Meredith, JC
Karim, A
机构：
[1] Howard Univ, Dept Chem, Washington, DC 20059 USA
[2] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2000年 / 220卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
295-COLL
引用
收藏
页码：U271 / U271
页数：1
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