Influence of working gas pressure on the properties of thin films of high-temperature superconductors obtained by magnetron sputtering

被引:0
|
作者
Vorob'ev, AK [1 ]
Gaponov, SV [1 ]
Gusev, SA [1 ]
Drozdov, YN [1 ]
Klyuenkov, EB [1 ]
Luchin, VI [1 ]
机构
[1] Russian Acad Sci, Inst Microstruct Phys, Nizhnii Novgorod, Russia
基金
俄罗斯基础研究基金会;
关键词
D O I
10.1134/1.1262035
中图分类号
O59 [应用物理学];
学科分类号
摘要
The surface morphology, composition, microstructure, and electrical properties of thin films of YBa2Cu3O7-x high-temperature superconductors, obtained by inverted magnetron sputtering, have been studied as a function of the pressure of the working gas mixture and results are presented. The main parameters of the magnetron discharge plasma near the substrate were determined by analyzing the characteristics of Langmuir probes. Changes in the properties of the films are considered to be caused by bombardment of the growing film with plasma ions accelerated in the floating potential field of the substrate. Films obtained at a pressure of 28 Pa and substrate temperature of 630 degrees C had a superconducting transition end temperature T-c,T- (off) = 89 K and a critical current density j(c) = 2 MA/cm(2) (at 77 K) and were free from secondary phase particles larger than 10 nm. (C) 1998 American Institute of Physics. [S1063-7850(98)03302-3].
引用
收藏
页码:159 / 161
页数:3
相关论文
共 50 条
  • [31] The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering
    CAO Hong
    ZHANG ChuanJun
    CHU JunHao
    Science China(Technological Sciences), 2014, (05) : 947 - 952
  • [32] Influence of Sputtering Power and Gas Pressure on the Preparation of Tungsten Films by DC Magnetron Sputtering
    Xing Xiaoshuai
    Liu Yingxia
    Yu Xiaodong
    Cheng Jingwei
    Zhao Xiuchen
    Nie Zhihua
    Tan Chengwen
    RARE METAL MATERIALS AND ENGINEERING, 2022, 51 (02) : 682 - 688
  • [33] Influence of Sputtering Power and Gas Pressure on the Preparation of Tungsten Films by DC Magnetron Sputtering
    Xing, Xiaoshuai
    Liu, Yingxia
    Yu, Xiaodong
    Cheng, Jingwei
    Zhao, Xiuchen
    Nie, Zhihua
    Tan, Chengwen
    Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2022, 51 (02): : 682 - 688
  • [34] Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering
    Mahdhi, H.
    Ben Ayadi, Z.
    Gauffier, J. L.
    Djessas, K.
    JOURNAL OF ELECTRONIC MATERIALS, 2016, 45 (01) : 557 - 565
  • [35] Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering
    H. Mahdhi
    Z. Ben Ayadi
    J. L. Gauffier
    K. Djessas
    Journal of Electronic Materials, 2016, 45 : 557 - 565
  • [36] Oxides as substrates for thin films of high-temperature superconductors
    Mendoza-Alvarez, ME
    Tabares-Muñoz, C
    REVISTA MEXICANA DE FISICA, 2000, 46 (01) : 8 - 13
  • [37] Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature
    Baoting Liu
    Yang Zhou
    Hongfang Zheng
    Man Li
    Zhe Guo
    Qingxun Zhao
    Yingcai Peng
    Rare Metals, 2011, 30 : 170 - 174
  • [38] Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature
    Liu Baoting
    Zhou Yang
    Zheng Hongfang
    Li Man
    Guo Zhe
    Zhao Qingxun
    Peng Yingcai
    RARE METALS, 2011, 30 (02) : 170 - 174
  • [40] Microstructure, mechanical and high-temperature tribological properties of amorphous SiC films by pulsed magnetron sputtering
    Wang, Linqing
    Wang, Li
    Li, Hao
    Cai, Wumin
    Wang, Junjun
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2023, 599