SIMULTANEOUSLY THERMIONIC VACUUM ARC DISCHARGES IN OBTAINING FERROMAGNETIC THIN FILMS

High quality granular ferromagnetic thin films on glass and silicon wafer substrates were obtained using the original thermionic vacuum arc (TVA) method developed at National Institute for Laser, Plasma and Radiation Physics. We report obtaining of 77-200 nm thick Cu/Ni/Fe structures. An experimental set-up, with three simultaneously discharges, was made to obtain the desired thin film composition and thickness. The structural and morphological properties of the prepared nanostructured films were analyzed by AFM (Atomic Force Microscopy), XRD (X-ray Diffraction) and SEM (Scanning Electron Microscopy). Magneto-Optical Kerr Effect studies were made in order to infer the changes in polarization of an optical radiation due to the magnetic field influence. In order to obtain concluding electrical measurements results, cooper electrodes were deposited using the same method before and after the actual three material thin structures. In this way significant changes in the electrical resistance behavior were noticed and were correlated with TVA plasma parameters used for film preparation.