Development of photosensitive insulating materials by organic-inorganic hybrid technologies

被引：0
|
作者：
Azuma, K
Nakamura, S
Unate, T
Nakasuga, A
Matsukawa, K
机构：
[1] Sekisui Chem Co Ltd, Minase Res Labs, Shimamoto, Osaka 6188589, Japan
[2] Osaka Municipal Tech Res Inst, Joto Ku, Osaka 5368553, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2005年 / 18卷 / 01期
关键词：
organic-inorganic hybrid; insulating materials; silsesquioxane; photolithography; transparency;
D O I：
暂无
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Novel photosensitive insulating materials by organic-inorganic hybrid technologies have been developed. These materials are comprised of organic silsesquioxane (OSQ) and photo acid generators (PAGs). OSQ is soluble in alkaline solutions. After UV light was exposed to OSQ and post exposure baking (PEB), OSQ was cross-linked and became insoluble in alkaline solutions of the resulting patterns with high photosensitivity. We found that the OSQ with low post-baking temperature had high insulating performance and transparency.
引用
收藏
页码：41 / 46
页数：6
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