Surface Morphology and Optical Mutation Properties of V2O5 Films Prepared with Different Oxygen Partial Pressures

被引:0
|
作者
Zhang, Shengbin [1 ]
Li, Yanhui [1 ,2 ]
Zhu, Nannan [3 ]
Zuo, Dunwen [4 ]
Wang, Yuqi [1 ]
Chen, Xiaoyu [1 ]
机构
[1] Qingdao Univ, Coll Mech & Elect Engn, Qingdao, Peoples R China
[2] Coll Mech & Elect Engn, Lab Fiber Mat & Modern Text, Growing Base State Key Lab, Qingdao, Peoples R China
[3] Nanjing Vocat Univ Ind Technol, Engn Technol Training Ctr, Nanjing, Peoples R China
[4] Nanjing Univ Aeronaut & Astronaut, Coll Mech & Elect Engn, Nanjing, Peoples R China
关键词
V2O5; films; oxygen partial pressure; surface morphology; optical mutation properties; OXIDE THIN-FILMS; PHASE-TRANSITION; VANADIUM; THICKNESS;
D O I
10.1080/10584587.2022.2074225
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
vanadium pentoxide films(V2O5) were deposited on sapphire substrates under four different oxygen partial pressures by magnetron sputtering. Then the films' crystallinity, surface morphology and optical mutation properties were researched. The results show that all the prepared films are polycrystalline V2O5, and the crystallization performance gets better with the oxygen pressure increases. In addition, the Root-Mean-Square(RMS) roughness decrease with the increase of oxygen pressure. Furthermore, with the oxygen pressure increases, the optical turn-off time and turn-on time are 2.2 and 36 ms, respectively down to 1.7 and 30 ms, and before/after phase-change transmittance, meanwhile, decreases from 75%/20% to 57%/11%, showing a great improvement in optical mutation properties.
引用
收藏
页码:78 / 84
页数:7
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