Monitoring Thermally Induced Cylindrical Microphase Separation of Polystyrene-block-poly(methyl methacrylate) by Atomic Force Microscopy

被引：0

作者：

Hiroshiba, Nobuya ^{[1
]}

Okubo, Ryo ^{[1
]}

Hattori, Azusa N. ^{[2
]}

Tanaka, Hidekazu ^{[2
]}

Nakagawa, Masaru ^{[1
]}

机构：

[1] Tohoku Univ, IMRAM, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan

[2] Osaka Univ, ISIR, Mihogaoka 8-1, Osaka 5670047, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2016年 / 29卷 / 05期

关键词：

block copolymer lithography; polystyrene-block-poly(methyl methacrylate); cylindrical microphase separation; PS-B-PMMA; BLOCK-COPOLYMER FILMS; THIN-FILMS; DIBLOCK COPOLYMERS; NANOSTRUCTURES; ARRAYS; REORGANIZATION; ORIENTATION; MORPHOLOGY; RESIST;

D O I：

10.2494/photopolymer.29.659

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Thermally induced growth of cylindrical microphase separation was observed for polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films on native oxide silicon substrates unmodified and modified with hydroxy-terminated polystyrene (PS-OH) by atomic force microscopy in dynamic force mode. The degrees of long-range order of the cylindrical microphase separation structures were investigated using the correlation length values. The correlation length became constant over 30 seconds regardless of the kind of substrates, while the PS-OH modified substrate caused a longer correlation length and a shorter closely packed periodicity in the cylindrical microphase separation than the bare silicon substrate did.

引用

页码：659 / 665

页数：7

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