Hydrogen diffusion through Ru thin films

被引：7
|
作者：
Soroka, O. [1 ]
Sturm, J. M. [1 ]
Lee, C. J. [2 ]
Schreuders, H. [3 ]
Dam, B. [3 ]
Bijkerk, F. [1 ]
机构：
[1] Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, POB 217, NL-7500 AE Enschede, Netherlands
[2] Fontys Inst Engn, De Rondom 1, NL-5612 AP Eindhoven, Netherlands
[3] Delft Univ Technol, Fac Appl Sci, Dept Chem Engn, Mat Energy Convers & Storage MECS, Maasweg 9, NL-2629 HZ Delft, Netherlands
来源：
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY | 2020年 / 45卷 / 29期
关键词：
Hydrogen diffusion; Ruthenium; Yttrium; Optical transmission; Activation energy; PERMEATION BARRIER; COMBINATORIAL METHOD; SOLUBILITY; ADSORPTION; STABILITY; RUTHENIUM; KINETICS; COATINGS; HYDRIDE;
D O I：
10.1016/j.ijhydene.2020.03.201
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this paper, an experimental measurement of the diffusion constant of hydrogen in ruthenium is presented. By using a hydrogen indicative Y layer, placed under the Ru layer, the hydrogen flux through Ru was obtained by measuring the optical changes in the Y layer. We use optical transmission measurements to obtain the hydrogenation rate of Y in a temperature range from room temperature to 100 degrees C. We show that the measured hydrogenation rate is limited mainly by the hydrogen diffusion in Ru. These measurements were used to estimate the diffusion coefficient, D, and activation energy of hydrogen diffusion in Ru thin films to be D = 5.9 x 10(-14) m(2)/s.exp (-0.33 eV/k(B)tau), with k(B) the Boltzmann constant and tau the temperature. (C) 2020 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：15003 / 15010
页数：8
相关论文
共 50 条
  • [31] HYDROGEN TRANSFER THROUGH THIN-FILMS FROM PALLADIUM ALLOYS
    BARANOV, VM
    ZOZULYA, VY
    NAZARKINA, EB
    KHIMICHESKAYA PROMYSHLENNOST, 1989, (01): : 70 - 70
  • [32] Materials Science of Ru and Ru Alloy Thin Films for Barrier Applications
    Liao, Wen
    Bost, Daniel
    Chiu, Chia-Yun
    Hwang, Gyeong S.
    Ekerdt, John G.
    2016 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE / ADVANCED METALLIZATION CONFERENCE (IITC/AMC), 2016, : 102 - 104
  • [33] DIFFUSION IN THIN-FILMS
    GUPTA, D
    JOURNAL OF METALS, 1987, 39 (07): : A23 - A23
  • [34] Graphene growth on polycrystalline Ru thin films
    Sutter, E.
    Albrecht, P.
    Sutter, P.
    APPLIED PHYSICS LETTERS, 2009, 95 (13)
  • [35] Silver direct electrodeposition on Ru thin films
    Koo, Hyo-Chol
    Cho, Sung Ki
    Lee, Chang Hwa
    Kim, Soo-Kil
    Kwon, Oh Joong
    Kim, Jae Jeong
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (05) : D389 - D394
  • [36] DIFFUSION AND PERMEATION OF INERT GASES AND DEUTERIUM THROUGH SILICON OXIDE THIN FILMS
    PERKINS, WG
    BEGEAL, DR
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1970, 15 (11): : 1367 - &
  • [37] Grain boundary diffusion through thin films. Application to permeable surfaces
    Preis, W
    Sitte, W
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (06) : 2986 - 2994
  • [38] An analytical solution for non-steady-state diffusion through thin films
    Mezin, A
    Lepage, J
    Abel, PB
    THIN SOLID FILMS, 1996, 272 (01) : 124 - 131
  • [39] Hydrogen-Accelerated Phase Transition and Diffusion in TiO2 Thin Films
    Mao, Wei
    Wilde, Markus
    Ogura, Shohei
    Chen, Jikun
    Fukutani, Katsuyuki
    Matsuzaki, Hiroyuki
    Terai, Takayuki
    JOURNAL OF PHYSICAL CHEMISTRY C, 2018, 122 (40): : 23026 - 23033
  • [40] Effect of substrate on hydrogen in and out diffusion from a-Si:H thin films
    Rao, R.
    Kail, F.
    Cabarrocas, P. Roca i
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (10) : 1051 - 1056
12345