An aberration control of projection optics for multi-patterning lithography

被引：18

作者：

Ohmura, Yasuhiro ^{[1
]}

Ogata, Taro ^{[1
]}

Hirayama, Toru ^{[1
]}

Nishinaga, Hisashi ^{[1
]}

Shiota, Takeshi ^{[1
]}

Ishiyama, Satoshi ^{[1
]}

Isago, Susumu ^{[1
]}

Kawahara, Hidetaka ^{[1
]}

Matsuyama, Tomoyuki ^{[1
]}

机构：

[1] Nikon Inc, Precis Equipment Co, Kumagaya, Saitama 3608559, Japan

来源：

OPTICAL MICROLITHOGRAPHY XXIV | 2011年 / 7973卷

关键词：

thermal aberration; lens controller; deformable mirror; astigmatism; double exposure; line cross;

D O I：

10.1117/12.879616

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In order to realize further improvement of productivity of semiconductor manufacturing, higher throughput and better imaging performance are required for the exposure tool. Therefore, aberration control of the projection lens is becoming more and more important not only for cool status performance but also heating status. In this paper, we show the improvements of cool status lens aberration, including scalar wavefront performance and polarization aberration performance. We also discuss various techniques for controlling thermal aberrations including reduction of heat in the lens, simulation, compensating knob, and adjusting method with actual imaging performance data during heating and cooling.

引用

页数：11

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