Ionized PVD promising for advanced metal deposition

被引：0
|
作者：
Comello, V
机构：
来源：
R&D MAGAZINE | 1999年 / 41卷 / 05期
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D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：55 / 56
页数：2
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