Modeling of Ionizing Radiation-Induced Degradation in Multiple Gate Field Effect Transistors

被引:35
|
作者
Esqueda, Ivan S. [1 ]
Barnaby, Hugh J. [1 ]
Holbert, Keith E. [1 ]
El-Mamouni, Farah [2 ]
Schrimpf, Ronald D. [2 ]
机构
[1] Arizona State Univ, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
[2] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37203 USA
关键词
Compact model; FinFETs; multiple gate field effect transistors (MuGFETs); silicon-on-insulator (SOI); total ionizing dose (TID); MOSFET MODEL; SOI; PSP;
D O I
10.1109/TNS.2010.2101615
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The radiation response of advanced non-planar multiple gate field effect transistors (MuGFETs) has been shown to have a strong dependence on fin width (W). The incorporation of total ionizing dose (TID) effects into a physics-based surface-potential compact model allows for the effects of radiation-induced degradation in MuGFET devices to be modeled in circuit simulators, e. g., SPICE. A set of extracted parameters are used in conjunction with closed-form expressions for the surface potential, thereby enabling accurate modeling of the radiation-response and its dependence on W. Total ionizing dose (TID) experiments and two-dimensional (2D) TCAD simulations are used to validate the compact modeling approach presented in this paper.
引用
收藏
页码:499 / 505
页数:7
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