Mechanisms of laser surface cleaning in liquid media

被引：0
|
作者：
Alloncle, P [1 ]
Isselin, JC [1 ]
Provost, M [1 ]
Autric, M [1 ]
机构：
[1] Inst Rech Phenomenes Hors Equilibre, F-13009 Marseille, France
来源：
HIGH-POWER LASER ABLATION, PTS 1-2 | 1998年 / 3343卷
关键词：
laser; cleaning; oxides; ablation; cavitation;
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
This paper deals with an experimental study on the mechanisms of laser surface cleaning process in a liquid medium. Experiments have been performed with oxides of different compositions irradiated with two different wavelengths: 1064nm, 532nn. Interpretations have been inferred from high speed visualizations, pressure recordings and surface samples analysis. Interesting results on the dynamics of the cavity resulting from ablation and its potential contribution to the cleaning effects have been carried out.
引用
收藏
页码：866 / 871
页数：6
相关论文
共 50 条
  • [21] Investigation on laser cleaning for decontaminated surface
    Furukawa, H
    Nishihara, K
    Yamanaka, C
    Nakai, S
    Imasaki, K
    Zhou, XL
    Umino, H
    Sakagishi, K
    Funahashi, S
    HIGH-POWER LASERS IN CIVIL ENGINEERING AND ARCHITECTURE, 2000, 3887 : 128 - 136
  • [22] Laser cleaning and surface preparation by pulsed laser impact
    Boquillon, JP
    PROCEEDINGS OF THE XIII INTERNATIONAL CONGRESS ON ELECTRICITY APPLICATIONS, VOLS 1 AND 2, 1996, : FIN37 - FIN44
  • [23] Energetic laser cleaning of metallic particles and surface damage on silica optics: Investigation of the underlying mechanisms
    Shen, Nan
    Demos, Stavros G.
    Negres, Raluca A.
    Rubenchik, Alexander M.
    Harris, Candace D.
    Matthews, Manyalibo J.
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2015, 2015, 9632
  • [24] LIQUID-FILM ENHANCED LASER CLEANING
    ZAPKA, W
    TAM, AC
    AYERS, G
    ZIEMLICH, W
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 473 - 478
  • [25] Particle removal mechanisms in cryogenic surface cleaning
    Toscano, C
    Ahmadi, G
    JOURNAL OF ADHESION, 2003, 79 (02): : 175 - 201
  • [26] Surface cleaning of silicon wafer by laser sparking
    Lee, JM
    Watkins, KG
    Steen, WM
    JOURNAL OF LASER APPLICATIONS, 2001, 13 (04) : 154 - 158
  • [27] Ablation and cleaning of wafer surface by excimer laser
    Kim, YK
    Kim, DJ
    Ryu, JK
    Pak, SS
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VI, 2001, 4274 : 9 - 17
  • [28] Estimation of Laser Ablation Surface Cleaning Efficiency
    X. Zhou
    K. Imasaki
    H. Furukawa
    S. Nakai
    C. Yamanaka
    The International Journal of Advanced Manufacturing Technology, 2002, 19 : 642 - 645
  • [29] Laser removal of thin layers for surface cleaning
    Apostol, Ileana
    Apostol, D.
    Damian, V.
    Iordache, Iuliana
    Garoi, F.
    Capello, E.
    INDLAS 2007: INDUSTRIAL LASER APPLICATIONS, 2008, 7007
  • [30] Laser cleaning of the contaminations on the surface of tire mould
    Ye, Yayun
    Jia, Baoshen
    Chen, Jing
    Jiang, Yilan
    Tang, Hongping
    Wang, Haijun
    Luan, Xiaoyu
    Liao, Wei
    Zhang, Chuanchao
    Yao, Caizhen
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2017, 31 (16-19):
12345