Overview of NIST metrology development for the semiconductor industry

被引:1
|
作者
Knight, S [1 ]
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
关键词
D O I
10.1109/RTP.2003.1249121
中图分类号
O414.1 [热力学];
学科分类号
摘要
The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension metrology, gate dielectric characterization, interconnect materials evaluation wafer surface inspection, mass flow controller calibration, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.
引用
收藏
页码:35 / 44
页数:10
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