Metrology needs and challenges for the semiconductor industry

被引：0
|
作者：
Schroeder, K [1 ]
Ashkenaz, S [1 ]
Hankinson, M [1 ]
机构：
[1] KLA Tencor Corp, San Jose, CA 95134 USA
来源：
CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000, INTERNATIONAL CONFERENCE | 2001年 / 550卷
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The aggressively shrinking process window drives the semiconductor manufacturer to examine, refine, and control all aspects of the manufacturing process. Process budgets leave little room for error contribution. Budget management, and ultimately achieving the goal, requires an understanding of the constituent components, and development of mitigation strategies. We present some of the challenges facing our industry and strategies that we are taking to address them.
引用
收藏
页码：38 / 41
页数：2
相关论文
共 50 条
  • [1] Metrology needs for the semiconductor industry over the next decade
    Melliar-Smith, M
    Diebold, AC
    [J]. CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 1998, 449 : 3 - 20
  • [2] CHALLENGES AND PROSPECTS OF X-RAY METROLOGY IN ADVANCED SEMICONDUCTOR INDUSTRY
    Song, Yang
    Huang, Yi
    Lin, Yi-Shi
    [J]. 2016 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC), 2016,
  • [3] Semiconductor inspection and metrology challenges
    Fielden, John
    [J]. 2018 31ST INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 2018,
  • [4] SUBMICRON METROLOGY IN THE SEMICONDUCTOR INDUSTRY
    CORLE, TR
    [J]. SOLID-STATE ELECTRONICS, 1992, 35 (03) : 391 - 402
  • [5] Development of metrology at NIST for the semiconductor, industry
    Knight, S
    [J]. CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 2003, 683 : 97 - 104
  • [6] Application development of virtual metrology in semiconductor industry
    Chang, JYC
    Cheng, FT
    [J]. IECON 2005: THIRTY-FIRST ANNUAL CONFERENCE OF THE IEEE INDUSTRIAL ELECTRONICS SOCIETY, VOLS 1-3, 2005, : 124 - 129
  • [7] Overview of NIST metrology development for the semiconductor industry
    Knight, S
    [J]. 11TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS, 2003, : 35 - 44
  • [8] Adopting semiconductor metrology to meet the challenges of MEMS manufacturing
    McKay, Roger A., Jr.
    Redmond, Susan
    Weller, Ron
    Yamamoto, Kuni
    Knutrud, Paul
    Podlesny, John
    Sundaram, Ganesh
    [J]. MICRO, 2006, 24 (03): : 35 - 40
  • [9] X-ray Metrology for the Semiconductor Industry Tutorial
    Sunday, Daniel F.
    Wu, Wen-Li
    Barton, Scott
    Kline, R. Joseph
    [J]. JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY, 2019, 124
  • [10] Challenges and opportunities in the semiconductor industry
    Polcari, MR
    [J]. 2004 INTERNATIONAL CONFERENCE ON INTEGRATED CIRCUIT DESIGN AND TECHNOLOGY, 2004, : 1 - 2
12345