Structural characteristics of nanocrystalline copper after carbon ion implantation

被引:6
|
作者
Lin, Wan-ming [1 ]
Wei, Ying-hui [1 ]
Du, Hua-yun [1 ]
Hou, Li-feng [1 ]
Wang, Guo-dong [1 ]
Bi, Hai-xiang [1 ]
Xu, Bing-she [1 ]
机构
[1] Taiyuan Univ Technol, Coll Mat & Technol, Taiyuan 030024, Peoples R China
关键词
Microstructures; Materials; Nanocrystalline; ONION FORMATION; ELECTRON-BEAM; NANOPARTICLES; IRRADIATION; GROWTH; SILVER;
D O I
10.1016/j.micron.2011.03.007
中图分类号
TH742 [显微镜];
学科分类号
摘要
A gradient structure was produced in a pure copper plate by means of surface mechanical attrition treatment (SMAT). The microstructure of the surface layer was reduced to nanoscale and the grain size increased gradually along the depth of the treated sample. In situ transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM) observation was performed on the nanocrystalline copper after implantation of carbon. Carbon atoms first precipitated along the edges of the copper substrate or at the surface, then formed amorphous carbon layers. Subsequently, onion-like fullerenes were formed under electron-beam irradiation. The effects of ion implantation, electron beam irradiation, nanostructure of the substrate and interaction of C and Cu atoms on the formation of the onion-like fullerenes are discussed. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:691 / 694
页数:4
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