Ultralow-voltage RAM technology - Current status and future trends

被引:1
|
作者
Itoh, K [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
关键词
D O I
10.1109/EDSSC.2003.1283471
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews leakage current reduction circuits for ultralow-voltage DRAMs and SRAMs. First, it discusses general features of leakage currents (especially, gate tunnel current and subthreshold current), their detrimental effects on RAMs, and the current status of leakage-current reduction. Second, it summarizes useful concepts to reduce subthreshold currents that can even be applied to the active mode. Third, the advantages of RAMs over random logic gates with respect to reducing subthreshold currents are clarified, and the above concepts are applied to RAM cells and peripheral circuits to reduce standby as well as active current. Finally, a perspective is given with emphasis on needs for new devices and circuits to reduce active-mode leakage currents, and for high-speed simple non-volattle RAMs.
引用
收藏
页码:3 / 8
页数:6
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