Physical Simulation of Si-Based Resistive Random-Access Memory Devices

被引:0
|
作者
Sadi, Toufik [1 ]
Wang, Liping [1 ]
Gerrer, Louis [1 ]
Asenov, Asen [1 ,2 ]
机构
[1] Univ Glasgow, Sch Engn, Glasgow G12 8LT, Lanark, Scotland
[2] Gold Stand Simulat Ltd, Glasgow G3 7JT, Lanark, Scotland
基金
英国工程与自然科学研究理事会;
关键词
Si-rich silica (SiOx) memristors; resistive switching; charge transport; self-heating; physical simulations; SILICON-OXIDE; MEMRISTOR;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a newly-developed three-dimensional (3D) physical simulator suitable for the study of resistive random-access memory (RRAM) devices. We explore the switching behavior of Si-rich silica (SiOx) RRAM structures, whose operation has been successfully demonstrated experimentally at ambient conditions [1]. The simulator couples self-consistently a simulation of oxygen ion and electron transport to a self-heating model and the 'atomistic' simulator GARAND. The electro-thermal simulation model provides many advantages compared to the classical phenomenological models based on the resistor breaker network. The simulator is validated with respect to experimental data and captures successfully the memristive behavior of the simulated SiOx RRAMs, by reconstructing the conductive filament formation and destruction phenomena in the 3D space. The simulation framework is useful for exploring the little-known physics of SiOx RRAMs, and providing efficient designs, in terms of performance, variability and reliability, for both memory devices and circuits.
引用
收藏
页码:385 / 388
页数:4
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