Optical design for EUV lithography source collector

被引：1
|
作者：
Zhang, Shuqing [1 ]
Wang, Qi [2 ]
Zhu, Dongyuan [1 ]
Li, Runshun [1 ]
Liu, Chang [3 ]
机构：
[1] Harbin Inst Technol, Res Ctr Space Opt Engn, Harbin 150080, Peoples R China
[2] Harbin Inst Technol, Inst Optoelect, Harbin 150080, Peoples R China
[3] Harbin Inst Technol, Ctr Composite Mat, Harbin 150080, Peoples R China
来源：
CHINESE OPTICS LETTERS | 2011年 / 9卷 / 05期
关键词：
PERFORMANCE; TOOL;
D O I：
10.3788/COL201109.052201
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors. It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus (IF). A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced. Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated. The design results indicate that the collector satisfies all the requirements.
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页数：4
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