Comment on 'Microwave generation by excitation of a plasma-filled slow-wave structure': reply

被引:0
|
作者
Wu, JQ [1 ]
机构
[1] Univ Elect Sci & Technol China, High Energy Elect Res Inst, Chengdu 610054, Peoples R China
关键词
D O I
10.1080/002072199133724
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper, ‘Microwave generation by excitation of a plasma-filled slow-wave structure’ written by Wu et al. in 1996, analysed the configuration as shown in figure 1. In this paper, equation (26) is the boundary condition of boundary 1 shown in figure 1, and equation (35) is the boundary condition of boundary 2 shown in figure 1. The above two equations are all derived from ∫ D ds = ∫ δ ρ dv. © 1999 Taylor and Francis Group, LLC.
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页码:99 / 100
页数:2
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