Carbon nanowall growth on carbon paper by hot filament chemical vapour deposition and its microstructure

被引：35

作者：

Lisi, N. ^{[1
]}

Giorgi, R. ^{[1
]}

Re, M. ^{[2
]}

Dikonimos, T. ^{[1
]}

Giorgi, L. ^{[1
]}

Salernitano, E. ^{[1
]}

Gagliardi, S. ^{[1
]}

Tatti, F. ^{[3
]}

机构：

[1] ENEA, Casaccia Res Ctr, I-00123 Rome, Italy

[2] ENEA, Brindisi Res Ctr, I-72100 Brindisi, BR, Italy

[3] FEI Co, NL-5651 GG Eindhoven, Netherlands

来源：

CARBON | 2011年 / 49卷 / 06期

关键词：

ELECTRON FIELD-EMISSION; PLASMA; FILMS; FABRICATION; NANOSHEETS; NANOTUBES; DIAMOND;

D O I：

10.1016/j.carbon.2011.01.056

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Carbon nanowall films were synthesized by plasma enhanced hot filament chemical vapour deposition on carbon paper, a three dimensionally structured material. The micro-structured nature of the carbon paper, which is composed of an irregular and open mesh of carbon fibres, allowed one to determine the microstructure of the carbon nanowalls both at the tip and at the fibre-nanowall base interface. The number of graphenes which pile up to form the structure of a single nanowall ranges from 1 to 2 at the tip up to several 10s at the base, making this material suitable to study and eventually exploit the electronic properties of graphenes on a macroscopic scale. Such material is promising for electrochemical applications. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：2134 / 2140

页数：7

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