Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films

Thin films of rare-earth (RE) oxides (Y2O3, PrOx, Gd2O3, and Dy2O3) were deposited. by atomic layer deposition from liquid heteroleptic RE((PrCp)-Pr-i)(2)(Pr-i-amd) precursors with either water or ozone as the oxygen source. Film thickness, crystallinity, morphology, and composition were studied. Saturation was achieved with Gd2O3 when O-3 was used as the oxygen source at 225 degrees C and with Y2O3 with both oxygen sources at as high temperature as 350 degrees C. The growth rates were 0.90-1.3 angstrom/cycle for these processes. PrOx was challenging to deposit with both oxygen sources but with long, 20 s purges after the water pulses uniform films could be deposited. However, saturation was not achieved. With Dy2O3, uniform films could be deposited and the Dy((PrCp)-Pr-i)(2)(Pr-t-amd)/O-3 process was close to saturation at 300 degrees C. The different oxygen sources had an effect on the crystallinity and impurity contents of the films in all the studied processes. Whether ozone water was better choice for oxygen source depended on the metal oxide material that was deposited.