Photodissociation effects on pulsed laser deposited silver oxide thin films: surface-enhanced resonance Raman scattering

被引:28
|
作者
Raju, N. Ravi Chandra [1 ]
Kumar, K. Jagadeesh [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Madras 600036, Tamil Nadu, India
关键词
photodissociation; surface-enhanced resonance Raman scattering; pulsed-laser deposition; silver oxide thin film; silver nanostructures; RECORDABLE COMPACT-DISK; SPECTROSCOPY; NANOSTRUCTURES; DYNAMICS; LAYERS; SERS;
D O I
10.1002/jrs.2895
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Temporal Raman scattering measurements with 488, 532 and 632 nm excitation wavelengths and normal Raman studies by varying the power (from 30 W/cm(2) to 2MW/cm(2)) at 488 nm were performed on silver oxide thin films prepared by pulsed-laser deposition. Initially, silver oxide Raman spectra were observed with all three excitation wavelengths. With further increase in time and power, silver oxide photodissociated into silver nanostructures. High-intensity spectral lines were observed at 1336 +/- 25 and 1596 +/- 10 cm(-1) with 488 nm excitation. No spectral features were observed with 633 nm excitation. Surface-enhanced resonance Raman scattering theory is used to explain the complex behavior in the intensity of the 1336/1596 cm(-1) lines with varying power of 488 nm excitation. Copyright (c) 2011 John Wiley & Sons, Ltd.
引用
收藏
页码:1505 / 1509
页数:5
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