Differential pulse adsorptive stripping voltammetric determination of nickel and cobalt in high purity arsenic metal/arsenous oxide

被引：0
|
作者：
Sounderajan, S [1 ]
Palrecha, MM [1 ]
机构：
[1] Bhabha Atom Res Ctr, Div Analyt Chem, Bombay 400085, Maharashtra, India
来源：
BULLETIN OF ELECTROCHEMISTRY | 2003年 / 19卷 / 07期
关键词：
DMG; adsorptive stripping voltammetry; nickel; cobalt; arsenic matrix;
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A sensitive method using adsorption accumulation of the dimethylglyoxime (DMG) complex on the hanging mercury drop electrode (HMDE) and differential pulse adsorptive stripping voltammetry (DPAdSV) for the simultaneous determination of trace amount of nickel and cobalt in high purity arsenic metal/arsenous oxide is described. 5 x 10(-4) M DMG in 0.01 M ammonia buffer of pH 9.0 is used as adsorption accumulation agent as well as supporting electrolyte. The determination limit is as low as 0.2 ppm for Ni and 0.1 ppm for Co using 100 mg sample with a relative standard deviation of 16% and 22% respectively.
引用
收藏
页码：301 / 304
页数：4
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