Retention and imprint properties in single-crystalline PLZT thin film capacitors

被引:0
|
作者
Kurasawa, M [1 ]
Kurihara, K [1 ]
Otani, S [1 ]
Kutami, M [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Retention and imprint properties were investigated in single-crystalline PLZT thin film capacitors. The capacitors showed an excellent retention property and an asymmetric voltage shift in P-V hysteresis loop depending on poling direction. These imply that the retention is attributed to the bulk thin film quality and the imprint is dominantly affected by the interface effect. In current-voltage measurements for initial and imprinted capacitors, the space charge distribution change was observed at the interface. The charge accumulation is considered to associate with the imprint failure.
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页码:173 / 176
页数:4
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