Modeling and filtering of optical emission spectroscopy data for plasma etching systems

被引：0
|
作者：
Rangan, S
Spanos, C
Poolla, K
机构：
来源：
PROCEEDINGS OF THE 1997 AMERICAN CONTROL CONFERENCE, VOLS 1-6 | 1997年
关键词：
D O I：
暂无
中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiB/Al(0.5% Cu)/TiN/SiO2 etch process.
引用
收藏
页码：627 / 628
页数：2
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