Device fabrication with solid-liquid-solid grown silicon nanowires

被引:28
|
作者
Lee, Eun Kyung [1 ]
Choi, Byoung Lyong [1 ]
Park, Yong Dae [2 ]
Kuk, Young [2 ]
Kwon, Sun Young [3 ]
Kim, Hyeong Joon [3 ]
机构
[1] Samsung Adv Inst Technol, Display Dev & Proc Lab, Yongin 449712, Kyunggi Do, South Korea
[2] Seoul Natl Univ, Dept Phys & Astron, Seoul 151, South Korea
[3] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
关键词
D O I
10.1088/0957-4484/19/18/185701
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High quality, single-crystal silicon nanowires were successfully grown from silicon wafers with a nickel catalyst by utilizing a solid-liquid-solid (SLS) mechanism. The nanowires were composed of a crystalline silicon core with an average diameter of 10 nm and a thick outer oxide layer of between 20 and 30 nm at a growth temperature of 1000 degrees C. When utilizing the SLS growth mechanism, the diameter of the silicon nanowire is dependent solely upon the growth temperature, and has no relation to either the size or the shape of the catalyst. The characteristics of the silicon nanowires are highly dependent upon the properties of the silicon substrate, such as the crystal phase of silicon itself, as well as the doping type. The possibility of doping of silicon nanowires grown via the SLS mechanism without any external dopant source was demonstrated by measuring the electrical properties of a silicon nanowire field effect transistor.
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页数:5
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