Reliability of GaN-HEMTs for High-Voltage Switching Applications (invited paper)

被引:0
|
作者
Saito, Wataru [1 ]
机构
[1] Toshiba Co Ltd, Semicond Co, Discrete Semicond Div, Kawasaki, Kanagawa 210, Japan
关键词
GaN; HEMT; High-Voltage Switching; ALGAN/GAN HFETS; FIELD-PLATES; OPERATION;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports that the maximum electric field is a dominant factor for reliability in high-voltage GaN-HEMTs. Four types of the GaN-HEMT with different field plate (FP) structures were tested in continuous switching operation mode to analyze the degradation mechanism and the optimal device design. From the on-resistance degradation dependence on the FP structure, we extract that the gate-edge electric field strongly affects the increase of the dynamic on-resistance. Although the FP-edge field also increased the dynamic on-resistance, its influence was weaker than that of the gate-edge field. The optimal FP structure minimizes the increase of the dynamic on-resistance by reducing the electric field peaks and showed no degradation of power efficiency at the boost converter operation.
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页数:5
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