Effects of heat treatment on structure of amorphous CNx thin films by pulsed laser deposition

被引：23
|
作者：
Aoi, Y [1 ]
Ono, K
Sakurada, K
Kamijo, E
Sasaki, M
Sakayama, K
机构：
[1] Ryukoku Univ, Fac Sci & Technol, Dept Chem Mat, Otsu, Shiga 5202194, Japan
[2] Ind Res Ctr Shiga Prefecture, Shiga 5203004, Japan
来源：
THIN SOLID FILMS | 2001年 / 389卷 / 1-2期
基金：
日本学术振兴会;
关键词：
carbon nitride; heat-treatment; laser abalation; structural properties;
D O I：
10.1016/S0040-6090(01)00888-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Investigation of compositional and structural modifications induced by heat treatment of pulsed laser deposited amorphous CNx(x similar to 0.23) thin film has been carried out. Fourier transform infrared, Raman scattering, X-ray photoelectron spectroscopies were carried out to investigate compositional and structural properties of films. The heat treatment induces a nitrogen loss of the him. The N/C ratio decreased from 0.23 for the as-deposited film to 0.17 for the film heat treated at 800 degreesC. N1s electron spectra showed nitrogen atoms bonded to sp(3) hybridized carbon preferentially removed by heat treatment, although those bonded to sp(2) hybridized carbon were stable. Simultaneously, growth of graphitic domains, i.e. graphitization of the film by heat treatment was observed by Raman spectroscopy. The nitrogen loss and changes in bonding structure concerned with nitrogen atoms by heat treatment are caused by the graphitization of amorphous CNx film induced by heat treatment. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：62 / 67
页数：6
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