Fabrication and Characterization of Multiquantum Shell Light-Emitting Diodes with Tunnel Junction

被引:9
|
作者
Murakami, Hideki [1 ]
Suzuki, Atsushi [1 ]
Nokimura, Kyohei [1 ]
Takebayashi, Minoru [1 ]
Goto, Nanami [1 ]
Terazawa, Mizuki [1 ]
Lu, Weifang [1 ]
Sone, Naoki [1 ,2 ]
Iida, Kazuyoshi [1 ,3 ]
Ohya, Masaki [1 ,3 ]
Kamiyama, Satoshi [1 ]
Takeuchi, Tetsuya [1 ]
Iwaya, Motoaki [1 ]
Akasaki, Isamu [1 ,4 ]
机构
[1] Meijo Univ, Dept Mat Sci & Engn, Fac Sci & Technol, Nagoya, Aichi 4688502, Japan
[2] Koito Mfg Co Ltd, Dept Res & Dev, Shizuoka 4248764, Japan
[3] TOYODA GOSEI Co Ltd, Optoelect Dept, Inazawa, Aichi 4928542, Japan
[4] Nagoya Univ, Akasaki Res Ctr, Nagoya, Aichi 4648603, Japan
关键词
GaN; light-emitting diodes; multiquantum shell structures; nanowires; tunnel junctions; GAN; GROWTH; DEPENDENCE; HYDROGEN; QUALITY;
D O I
10.1002/pssa.201900774
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A GaInN/GaN multiquantum shell (MQS) structure grown over GaN nanowires can be utilized as active regions in optoelectronic devices because of its advantages such as high crystalline quality and the absence of internal polarization. To improve the current injection toward the sidewall of the MQS active regions, a tunnel junction (TJ) and n-GaN-embedded cap layer are adopted without using an indium-tin-oxide film. A light-emitting diode (LED) composed of n-GaN nanowires, MQS active regions, TJs, and an n-GaN-embedded cap layer is demonstrated for the first time. Without the activation process of Mg acceptors, the MQS LED exhibits a linear increase in the light output with current injection and a high operating voltage. After removing the upper part of the n-GaN-embedded cap layer, thermal annealing is confirmed to activate Mg acceptors in p-GaN and p(+)-GaN, and the reduction of the operating voltage is observed, despite the lack of current spreading in the n-GaN-embedded cap layer by Mg diffusion.
引用
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页数:5
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