Theoretical photoemission and X-ray emission spectra of nickel and cobalt disilicide films

被引:1
|
作者
Pereslavtseva, NS [1 ]
Kurganskii, SI [1 ]
机构
[1] Voronezh State Univ, Voronezh 394693, Russia
关键词
electronic structure; photoemission spectra; silicide;
D O I
10.1016/S0368-2048(00)00345-5
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Ab initio calculations of the electronic structure of nickel and cobalt disilicide films were made in the terms of the film method of linearized augmented plane waves. Calculated photoemission and X-ray emission spectra were compared with experimental data. The structure of photoemission spectra of the films at low excitation energies (up to 50 eV) is stipulated by d-states of transition metal and s- and p-states of silicon. Compared with the spectra of the bulk samples, Si L-2,L-3 spectra of film silicides demonstrate an increased intensity of the peak near Fermi level. The nature of this transformation is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.
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页码:549 / 554
页数:6
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