Nanocrystalline silicon thickness dependence of transmission characteristics of CPWs on surface-passivated high-resistivity silicon substrates

被引:3
|
作者
Wang, R. -L. [1 ]
Su, Y. -K. [2 ]
Chen, C. -J. [2 ]
Hsueh, T. -J.
机构
[1] Natl Kaohsiung Normal Univ, Dept Elect Engn, Yanchao Township 824, Kaohsiung Count, Taiwan
[2] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
关键词
D O I
10.1049/el.2011.2030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A nanocrystalline silicon (nc-Si) layer was used as a surface-passivation layer (SPL) on a high-resistivity silicon (HR-Si) substrate. The transmission loss (alpha(TL)) of coplanar waveguide (CPW) lines on oxide/SPL/HR-Si substrates with an nc-Si SPL of 100, 200, and 400 nm was measured and analysed. The experimental results demonstrate that the thicker nc-Si SPL provides better passivation effect and the alpha(TL) can be down to 0.69 dB/cm. The equivalent series resistance and shunt conductance were extracted to investigate the dependence of alpha(TL) on the SPL thickness. The cross-talk effect of CPWs on oxide/SPL/HR-Si substrates was also studied.
引用
收藏
页码:1133 / U124
页数:2
相关论文
共 50 条
  • [1] Surface-passivated high-resistivity silicon substrates for RFICs
    Rong, B
    Burghartz, JN
    Nanver, LK
    Rejaei, B
    van der Zwan, M
    [J]. IEEE ELECTRON DEVICE LETTERS, 2004, 25 (04) : 176 - 178
  • [2] Surface-passivated high-resistivity silicon as a true microwave substrate
    Spirito, M
    De Paola, FM
    Nanver, LK
    Valletta, E
    Rong, BF
    Rejaei, B
    de Vreede, LCN
    Burghartz, JN
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2005, 53 (07) : 2340 - 2347
  • [3] Analysis of electron transport in surface-passivated nanocrystalline porous silicon
    Koijma, A
    Koshida, N
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (4B): : 2395 - 2398
  • [4] Radio-Frequency Inductors on High-Resistivity Silicon Substrates with a Nanocrystalline Silicon Passivation Layer
    Wang, Ruey-Lue
    Chen, Chao-Jung
    Lin, Yu-Ru
    Liu, Pin-Yi
    Su, Yan-Kuin
    Hsueh, Ting-Jen
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (04)
  • [5] RF MEMS Passives on High-Resistivity Silicon Substrates
    Shim, Yonghyun
    Raskin, Jean-Pierre
    Neve, Cesar Roda
    Rais-Zadeh, Mina
    [J]. IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2013, 23 (12) : 632 - 634
  • [6] Electrical characteristics of multigraphene films grown on high-resistivity silicon carbide substrates
    A. A. Lebedev
    A. M. Strel’chuk
    D. V. Shamshur
    G. A. Oganesyan
    S. P. Lebedev
    M. G. Mynbaeva
    A. V. Sadokhin
    [J]. Semiconductors, 2010, 44 : 1389 - 1391
  • [7] Electrical Characteristics of Multigraphene Films Grown on High-Resistivity Silicon Carbide Substrates
    Lebedev, A. A.
    Strel'chuk, A. M.
    Shamshur, D. V.
    Oganesyan, G. A.
    Lebedev, S. P.
    Mynbaeva, M. G.
    Sadokhin, A. V.
    [J]. SEMICONDUCTORS, 2010, 44 (10) : 1389 - 1391
  • [8] Transmission Performances of CPW Lines on a Laser-Crystallization Polysilicon Passivated High-Resistivity Silicon Substrate
    Wang, Ruey-Lue
    Su, Yan-Kuin
    Chen, Chao-Jung
    [J]. IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY, 2012, 2 (05): : 847 - 851
  • [9] PHYSICAL CHARACTERISTICS OF HIGH-RESISTIVITY MICRORESISTORS ON SILICON SUBSTRATE
    KASSABOV, JD
    [J]. DOKLADI NA BOLGARSKATA AKADEMIYA NA NAUKITE, 1973, 26 (02): : 163 - 166
  • [10] Comparison of high-resistivity silicon surface passivation methods
    Norling, Martin
    Kuylenstierna, Dan
    Vorobiev, Andrei
    Reimann, Klaus
    Lederer, Dimitri
    Raskin, Jean-Pierre
    Gevorgian, Spartak
    [J]. 2007 EUROPEAN MICROWAVE INTEGRATED CIRCUITS CONFERENCE, VOLS 1 AND 2, 2007, : 300 - +