Effects of doping, electron irradiation, H+ and He+ implantation on the thermoelectric properties of Bi2Se3 single crystals

被引:27
|
作者
Saji, A [1 ]
Ampili, S
Yang, SH
Ku, KJ
Elizabeth, M
机构
[1] Cochin Univ Sci & Technol, Dept Phys, Crystal Growth Lab, Cochin 682022, Kerala, India
[2] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Mat & Proc Simulat Lab, Taejon 305701, South Korea
关键词
D O I
10.1088/0953-8984/17/19/005
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
As-grown single crystals of Bi2Se3 are doped with varying percentages of tellurium. These crystals are irradiated and implanted with electrons of energy 8 MeV and H+ and He+ ions of energy 1.26 MeV for comparative studies on their properties. Effects on the thermoelectric properties of Bi2Se3 due to high-energy electron bombardment (8 MeV), H+ and He+ ion implantation and doping are studied at temperatures ranging from 150 to 380 K. Crystal homogeneity and surface dislocations are determined using EDAX and SEM. Hot-probe and Hall effect measurements show that as-grown, electron irradiated and ion implanted crystals are n-type. Thermal diffusivity measurements prove the effective scattering mechanism (phonons) in Bi2Se3 crystals and provide a valid reason for reduced thermo-power in doped crystals.
引用
收藏
页码:2873 / 2888
页数:16
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