Bias enhanced nucleation and bias textured growth of diamond on silicon(100) in hot filament chemical vapor deposition

被引:23
|
作者
Huang, JT [1 ]
Yeh, WY
Hwang, J
Chang, H
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan
[2] Natl Tsing Hua Univ, Dept Chem, Hsinchu, Taiwan
关键词
bias nucleation; bias growth; diamond film;
D O I
10.1016/S0040-6090(97)00474-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A four-step process, i.e. pretreatment, heating, bias nucleation and bias growth, was developed to enhance diamond nucleation and to grow textured diamond(100) on Si(100) in a hot filament chemical vapor deposition chamber. A polycrystalline diamond film was optimally nucleated on Si(100) during the period of nucleation enhancement via a bias of - 250 V for approximately 30 min, with 1% of methane concentration in hydrogen flowing into the chamber. The nucleation density of diamond is approximately 10(7) cm(-2). The uniform nucleation area is as large as 1.5 in. in diameter. A textured diamond(100) film was grown on the nucleated polycrystalline diamond film. simply by adding a bias of -50 V at the growth step. The capability of using negative bias to control the orientation of diamond rains in the hot filament chemical vapor deposition system is new to the diamond community. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:35 / 39
页数:5
相关论文
共 50 条
  • [42] Effects of cobalt and cobalt oxide buffer layers on nucleation and growth of hot filament chemical vapor deposition diamond films on silicon (100)
    Dar, Mushtaq Ahmad
    Abuhimd, Hatem
    Ahmad, Iftikhar
    Islam, Mohammad
    Karim, Mohammad Rezaul
    Shin, Hyung-Shik
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2014, 31 (07) : 1271 - 1275
  • [43] Epitaxially oriented growth of diamond on silicon by hot filament chemical vapor deposition
    Chen, QJ
    Wang, LX
    Zhang, Z
    Yang, J
    Lin, ZD
    APPLIED PHYSICS LETTERS, 1996, 68 (02) : 176 - 178
  • [45] Nucleation and growth of diamond films on aluminum nitride by hot filament chemical vapor deposition
    Wang, WL
    Zhang, RQ
    Liao, KJ
    Sun, YW
    Wang, BB
    DIAMOND AND RELATED MATERIALS, 2000, 9 (9-10) : 1660 - 1663
  • [46] Effect of nucleation rate on heteroepitaxial diamond growth on Si(100) via electron-emission-enhanced nucleation by hot filament chemical vapor deposition
    Liao, KJ
    Wang, WL
    Feng, B
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1998, 167 (01): : 117 - 123
  • [47] Bias enhanced nucleation of diamond on silicon (100) in a HFCVD system
    Janischowsky, K
    Ebert, W
    Kohn, E
    DIAMOND AND RELATED MATERIALS, 2003, 12 (3-7) : 336 - 339
  • [48] Experimental and theoretical studies of diamond nucleation on silicon by biased hot filament chemical vapor deposition
    Wang, BB
    Wang, WL
    Liao, KJ
    Xiao, JL
    PHYSICAL REVIEW B, 2001, 63 (08)
  • [49] NUCLEATION OF DIAMOND DURING HOT FILAMENT CHEMICAL VAPOR-DEPOSITION
    SINGH, J
    VELLAIKAL, M
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (06) : 2831 - 2834
  • [50] Electron-emission-enhanced diamond nucleation on Si by hot filament chemical vapor deposition
    Chen, QJ
    Lin, ZD
    APPLIED PHYSICS LETTERS, 1996, 68 (17) : 2450 - 2452