Functionally graded TiN/TiNi shape memory alloy films

被引：190
|
作者：
Fu, YQ [1 ]
Du, HJ [1 ]
Zhang, S [1 ]
机构：
[1] Nanyang Technol Univ, Micromachines Ctr, Sch Mech & Prod Engn, Singapore 639798, Singapore
来源：
MATERIALS LETTERS | 2003年 / 57卷 / 20期
关键词：
TiNi; thin films; TiN; sputtering; shape memory;
D O I：
10.1016/S0167-577X(02)01419-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 mum) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：2995 / 2999
页数：5
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