Probing the mechanical properties of vertically-stacked ultrathin graphene/Al2O3 heterostructures

被引:9
|
作者
Munther, Michael [1 ]
Shaygan, Mehrdad [2 ]
Centeno, Alba [3 ]
Neumaier, Daniel [2 ]
Zurutuza, Amaia [3 ]
Momeni, Kasra [4 ]
Davami, Keivan [1 ]
机构
[1] Lamar Univ, Dept Mech Engn, Beaumont, TX 77705 USA
[2] AMO GmbH, Adv Microelect Ctr Aachen, Otto Blumenthal Str 25, Aachen, Germany
[3] Graphenea SA, Donostia San Sebastian 20018, Spain
[4] Louisiana Tech Univ, Dept Mech Engn, Ruston, LA 71272 USA
基金
欧盟地平线“2020”;
关键词
graphene-based heterostructures; two-dimnesional material characterization; atomic force microscopy; nanoindentation; mechanical characterization; ATOMIC LAYER DEPOSITION; BORON-NITRIDE; ELASTIC PROPERTIES; MOS2; OXIDE; STRENGTH; WS2;
D O I
10.1088/1361-6528/aafd53
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The superior intrinsic mechanical properties of graphene have been widely studied and utilized to enhance the mechanical properties of various composite materials. However, it is still unclear how heterostructures incorporating graphene behave, and to what extent graphene influences their mechanical response. In this work, a series of graphene/Al2O3 composite films were fabricated via atomic layer deposition of Al2O3 on graphene, and their mechanical behavior was studied using an experimental-computational approach. The inclusion of monolayer chemical vapor deposited graphene between ultrathin Al2O3 films (1.5-4.5 nm thickness) was found to enhance the overall stiffness by as much as 70% compared to a pure Al2O3 film of similar thickness (similar to 150 GPa to similar to 250 GPa). Here, for the first time, the combination of graphene and Al2O3 in vertically-stacked heterostructures results in advanced hybrid films of unprecedented mechanical stiffness that also possess qualities desirable for graphene-based transistors and flexible electronics.
引用
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页数:9
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