Characterization of low-temperature microwave annealed PZT thin films with various thicknesses

被引:0
|
作者
Bhaskar, Ankain [1 ]
Chang, T. H. [1 ]
Chang, H. Y. [2 ]
Cheng, S. Y. [3 ]
机构
[1] Natl Tsing Hua Univ, Dept Phys, Hsinchu, Taiwan
[2] Natl Taiwan Ocean Univ, Dept Marine Engn, Keelung, Taiwan
[3] Ind Technol Res Inst, Mat & Chem Res Lab, Hsinchu, Taiwan
关键词
ferroelectric; PZT; perovskite phase;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ferroelectric lead zirconium titanate (Pb(ZrxTi1-x)O-3) thin films with various thicknesses were fabricated on Pt/Ti/SiO2/Si substrates using the sol-gel method with 2.45 GHz microwave energy. Investigations have been made on the crystal structure, surface morphology, dielectric and ferroelectric properties of the films. The thicknesses of PZT film were in the range of 99 to 420 mn, and films were annealed at 450 degrees C for 30 min. The 99 and 168 nm-thick PZT films have mixed pyrochlore and perovskite phases. Above 168 nm-thick PZT films have complete perovskite phase. The full width at half maximum (FWHM), and the surface roughness were decreased as the film thickness increased. Relative dielectric constant and remnant polarization increased as the film thickness increased, which reflect the difference in crystallinity.
引用
收藏
页码:519 / +
页数:2
相关论文
共 50 条
  • [1] Low-temperature processing of PZT thin films by 2.45 GHz microwave heating
    Wang, Z. J.
    Otsuka, Y.
    Cao, Z.
    Zhu, M. W.
    Yoshikawa, N.
    Kokawa, H.
    SMART MATERIALS V, 2008, 7267
  • [2] Optimization of the low-temperature MOCVD process for PZT thin films
    Wang, CH
    Won, DJ
    Choi, DJ
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2000, 37 (06) : 1062 - 1066
  • [3] Low-temperature preparation and characterization of the PZT ferroelectric thin films sputtered on FTO glass substrate
    Wang, Z. D.
    Lai, Z. Q.
    Hu, Z. G.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2014, 583 : 452 - 454
  • [4] Electrical properties of low-temperature processed PZT thin films with preferred orientations
    Suzuki, H
    Kondo, Y
    Kaneko, S
    Hayashi, T
    FERROELECTRIC THIN FILMS VIII, 2000, 596 : 241 - 246
  • [5] Contribution to the low-temperature crystallization of PZT-based CSD thin films
    Mandeljc, M
    Kosec, M
    Malic, B
    Samardzija, Z
    INTEGRATED FERROELECTRICS, 2001, 36 (1-4) : 163 - 172
  • [6] Low-Temperature Synthesis and Characterization of ITO Thin Films
    Fang, Wei-Chuan
    Leu, Min-Sheng
    E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2009, 7 : 553 - 556
  • [7] Microwave-assisted Low-temperature Growth of Thin Films in Solution
    B. Reeja-Jayan
    Katharine L. Harrison
    K. Yang
    Chih-Liang Wang
    A. E. Yilmaz
    Arumugam Manthiram
    Scientific Reports, 2
  • [8] Microwave-assisted Low-temperature Growth of Thin Films in Solution
    Reeja-Jayan, B.
    Harrison, Katharine L.
    Yang, K.
    Wang, Chih-Liang
    Yilmaz, A. E.
    Manthiram, Arumugam
    SCIENTIFIC REPORTS, 2012, 2
  • [9] Low-temperature crystallization of amorphous silicon thin films by microwave heating
    Lee, JN
    Kim, YC
    Choi, YW
    Ahn, BT
    FLAT PANEL DISPLAY MATERIALS III, 1997, 471 : 173 - 178
  • [10] Microwave characterization of PZT/ZrO2 thin films
    Min, Deokki
    Hoivik, Nils
    Jensen, Geir Uri
    Hanke, Ulrik
    40TH EUROPEAN MICROWAVE CONFERENCE, 2010, : 1579 - 1582