Nanolithography based on photocatalysis of TiO2 using an atomic force microscope

被引：4
|
作者：
Kobayashi, K [1 ]
Tomita, Y [1 ]
Maeda, Y [1 ]
机构：
[1] Shizuoka Univ, Fac Engn, Dept Mat Sci, Hamamatsu, Shizuoka 4328561, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 7B期
关键词：
nanolithography; photocatalysis; TiO2; atomic force microscope; stearic-acid film;
D O I：
10.1143/JJAP.44.5829
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Stearic-acid films have been deposited on single-crystalline TiO2(110) substrates by vacuum evaporation. No changes are seen in atomic-force microscope (AFM) topographic images of the stearic-acid films after a scan at a bias voltage of -10 to 10 V in the dark. Similarly, ultraviolet irradiation at bias voltage < 0.0 V brings about no changes in the AFM topographic images. In contrast, a rectangular hole with a size of 200nm x 200nm is formed in the stearic-acid film after a scan at 10 V under ultraviolet irradiation. No current flows on the stearic-acid film, whereas an appreciable current flows at -2.0 V at the rectangular hole. Photocatalytic decomposition of the stearic-acid films deposited on the TiO2(110) substrates occurs at the area in which a bias voltage of 10 V is applied. The letters "YT" with a line width of 30 nm are drawn in the stearic-acid film by AFM-based photocatalysis.
引用
收藏
页码：5829 / 5831
页数：3
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