Hydrogen release from deposited beryllium layers

被引:0
|
作者
Shestakov, VP [1 ]
Klepikov, AK [1 ]
Chikhray, YV [1 ]
Tazhibaeva, IL [1 ]
机构
[1] Al Farabi Kazakh State Univ, NIIETF, Almaty 480012, Kazakhstan
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The analysis of hydrogen retained in deposited beryllium layers deposited by magnetron sputtering was carried out by means of thermodesorption (TDS) technique. Two hydrogen release peaks were clearly seen on the thermodesorption curves at the temperatures 780-800 K and 920-970 K. Hydrogen concentrations in the deposited beryllium layers were calculated from the gas release curves corresponding to the number of Be atoms in the berylliyum layer of 100% theoretical density. Average hydrogen concentration in the beryllium samples loaded in the process of magnetron sputtering was equal to 3800+/-200 appm. The experiments with beryllium layers, enriched with carbon, revealed the increase of retained hydrogen concentration up to 9600+/-200 appm. Assuming that gas release can be described within the framework of model of diffusion fi-om layer system BeO-Be-BeO, hydrogen diffusion coefficient in BeO and the trapping and detrapping constants for the traps appearing in beryllium in the process of deposition were evaluated.
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页码:296 / 300
页数:5
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