Fabrication and characterization of low-loss optical waveguides using a novel photosensitive polyimide

被引：8

作者：

Yurt, N ^{[1
]}

Mune, K

Naito, R

Fukuoka, T

Mochizuki, A

Matsumoto, K

Meredith, G

Peyghambarian, N

Jabbour, GE

机构：

[1] Univ Arizona, Ctr Opt Sci, Tucson, AZ 85721 USA

[2] Nitto Denko Co Ltd, Core Technol Ctr, Osaka 5678680, Japan

[3] Nitto Denko Tech Co Ltd, Oceanside, CA 92054 USA

[4] Arizona State Univ, Dept Chem & Mat Engn, Tempe, AZ 85287 USA

[5] Arizona State Univ, Flexible Display Ctr, Tempe, AZ 85287 USA

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 2005年 / 23卷 / 03期

关键词：

optical communications; optical losses; photosensitive materials; polymer waveguides; polyimide;

D O I：

10.1109/JLT.2005.843492

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents simple fabrication of optical waveguides using a novel photosensitive polyimide (PSPI). PSPI has a glass transition temperature (Tg) of 330 degrees C and is directly patterned by ultraviolet (UV) exposure and wet-chemical development, lending itself to low-cost fabrication techniques. The fabricated waveguides possess low optical absorption at 1.3 and 1.5 mu m. Single and multimode buried ridge waveguides were made and tested, and a 0.4-dB/cm optical propagation loss is measured at 1.55 mu m.

引用

页码：1291 / 1294

页数：4

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