Preferred crystallographic orientation relationships of nickel films deposited on (100) cubic-zirconia substrates (vol 372, pg 37, 2000)

被引：0
|
作者：
Dickey, EC
Ma, Y
Bagiyono
Lian, GD
Sinnott, SB
Wagner, T
机构：
[1] Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USA
[2] Max Planck Inst Met Forsch, D-70174 Stuttgart, Germany
来源：
THIN SOLID FILMS | 2001年 / 384卷 / 02期
关键词：
D O I：
10.1016/S0040-6090(01)00801-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：307 / 307
页数：1
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