Influence of deposition parameters on the stress of magnetron sputter-deposited AlN thin films on Si(100) substrates (vol 18, pg 423, 2003)

被引：0
|
作者：
Iriarte, GF [1 ]
Engelmark, F [1 ]
Ottosson, M [1 ]
Katardjiev, IV [1 ]
机构：
[1] Uppsala Univ, Anstrom Lab, SE-75121 Uppsala, Sweden
来源：
JOURNAL OF MATERIALS RESEARCH | 2003年 / 18卷 / 07期
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：1733 / 1733
页数：1
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